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This video demonstrates how to create nano-scale images by bombarding a resist with electrons. The resist is a material that is used to create patterns on a substrate. The video shows how to create the images using an insulating substrate, a resist, and a spin coater. The resist is then dropped onto the wafer and spun at a high speed to create a thin surface layer. The images are then developed with cold isopropyl alcohol and washed away with deionized water.
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